산화물 나노패턴 식각장치

ename_ko: 
산화물 나노패턴 식각장치
ename_en: 
RIE
emodel: 
RIE-200ip
institution: 
응용물리연구소
location: 
관악 자연과학대학 (19동 420호)
epname: 
김영찬
tel: 
02-871-7104
email: 
kyc1607@snu.ac.kr
keyword: 
1. Main Chamber - Plasma source type : Parallel plate plasma (CCP) - RF power supply : 13.56 MHz, 600W, Automatic matching - Vac. Chamber : aluminum chamber, anti-corrosion treated surface - RIE platen : water cooled, for Φ6“ 2. Loadlock Chamber - aluminum chamber with view port - direct sample transfer under vacuum 3. Pumping system - Main chamber : low vacuum gauge and wide range gauge - Loadlock chamber : low vacuum gauge - Turbo molecular pump (300L/sec) backed up with mechanical pump (1000L/sec) - Base pressure : 1.0E-7Torr 4. Gas distribution system - Mass Flow controller (MFC) : BCl3, CF4, Ar, O2 5. Control system - Safety interlocked - pressure, self bias, RF power, Turbo speed and valve, and MFC status displays
code: 
iap19_rie

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