자외선 패턴 장치
Submitted by rnd_admin on Tue, 10/22/2024 - 00:10
ename_ko:
자외선 패턴 장치
ename_en:
Mask Aligner (UV Patterning System)
emodel:
MJB4
institution:
응용물리연구소
location:
관악 자연과학관2
(19동 420호)
epname:
김영찬
tel:
02-871-7104
email:
kyc1607@snu.ac.kr
link:
https://iap.snu.ac.kr/equipment/list?cateidx=19
keyword:
1. Machine Body
- Machine base with alignment stage and exposure unit
- Split field microscope with eyepieces and turret
- Video image system for microscope
- Objective 5X (2EA) Objective 10X (2EA)
- Lamp adapter
- Lamp power supply unit CIC1200
- High resolution UV optics for 350 ~ 450 nm
- Internal light sensor 365/405NM for CIC1200
2. Accessories
- Teflon coated chuck for 5×5 mm and 20×20 mm piece substrate with vacuum Mode
- Mask holder for 5“×5“mask with opening of 2“×2“ substrate
- UV optometer
- UV light measurement probe 365/405NM for optometer
- Lamp 350W/S (2EA)
- Vacuum pump for facility
- Vibration isolation damping systemⅡ. 기능
- Substrate Size : For 5×5 mm and 20×20 mm piece substrate
- Mask Size : For 5“×5“mask
- Exposure Optics : Hg-Lamp 350W
- UV400 : 350 ~ 450 nm (I-H-G-line)
- Intensity Uniformity: <±3%
- Printing Resolution : down to 0.7~0.8 μm
- Alignment Accuracy : down to 0.5 μm with TSA
code:
iap19_mask aligner