유도결합플라즈마 반응성이온식각기
Submitted by rnd_admin on Tue, 10/22/2024 - 00:10
ename_ko:
유도결합플라즈마 반응성이온식각기
ename_en:
(inductively-coupled-plasmareactive-ion etcher)
MEMS ICP METAl ETCHER
emodel:
PLASMAPRO100 COBRA300
institution:
반도체공동연구소
location:
반도체공동연구소
(104동 2층팹 C5지역)
epname:
박종승
tel:
880-8642
email:
pjs@snu.ac.kr
link:
https://isrc.snu.ac.kr/new/contents/menu4/equip_data.php?seq=99
keyword:
MEMS 전용 (Class 10000 이하)
Piece~6inch wafer
InP박막 고온(200도) 공정서비스
InP > 130 / sec Selectivity to Sio2 > 18:1
Ti > 50/sec, Selectivity to PR > 0.8:1
Cr > 120/Sec. Selectivity to PR > 0.7:1
Inp, Ti, Cr, Etch
code:
ICP12